惠州市清洋实业有限公司

◆ Process Capacity: 160K sheets/month (equivalent to 6.2* single unit about 10KK pcs/M)
◆ Production Line Configuration: 12 production lines (10 G4.5 Panel Slimming lines, 2 G5 Panel Slimming lines)
◆ Maximum Panel Size: 1200mm*1300mm
◆ Minimum Panel Slimming Thickness: 0.15+0.15mm, single sheet 0.12mm
◆ Process Technology: Chemical Etching (Double-sided/Single-sided) + Physical Polishing + ITO Coating

Introduction to Frosted AG
Basic Principle of AG:
AG treatment involves processing the glass surface to make it rough. When light hits this rough surface, it scatters in all directions, dispersing the incoming light at various angles. This prevents viewers from experiencing glare or dizziness. (The process transforms specular reflection into diffuse reflection through chemical treatment.)
The AG effect is achieved through sandblasting + chemical polishing.

☆ Sandblasting
The sandblasting solution evenly covers the glass surface and reacts chemically with the SiO2 component of the glass. The resulting salts crystallize and deposit on the glass surface, blocking further reaction between the glass and the sandblasting solution. Areas not blocked continue to react with the solution until a dense crystalline layer forms on the glass surface. After DI water rinsing, the crystalline layer is washed away, leaving an uneven texture on the glass surface.

Introduction to Frosted AG
Basic Principle of AG:
AG treatment involves processing the glass surface to make it rough. When light hits this rough surface, it scatters in all directions, dispersing the incoming light at various angles. This prevents viewers from experiencing glare or dizziness. (The process transforms specular reflection into diffuse reflection through chemical treatment.)
The AG effect is achieved through sandblasting + chemical polishing.

☆ Sandblasting
The sandblasting solution evenly covers the glass surface and reacts chemically with the SiO2 component of the glass. The resulting salts crystallize and deposit on the glass surface, blocking further reaction between the glass and the sandblasting solution. Areas not blocked continue to react with the solution until a dense crystalline layer forms on the glass surface. After DI water rinsing, the crystalline layer is washed away, leaving an uneven texture on the glass surface.

The basic principle of CD (CD pattern):
The Photo process process involves the use of photosensitive materials to treat the glass surface, followed by etching and other techniques to create a pattern on the glass surface resembling the texture of a CD disc. This process provides a high-end surface treatment that offers visual appeal and a sense of three-dimensionality.

The CD effect is achieved through coating, exposure, and development.

☆ Coating
A thin layer of photoresist is evenly applied to the clean and dry glass surface using a scraper. After curing, this layer serves as a medium for the subsequent exposure process, enabling the formation of patterns.

☆ Exposure
A chromium plate is used to block strong light, allowing it to irradiate only the exposed areas of the photoresist. The photoresist in these areas becomes susceptible to removal in the subsequent development process after being exposed to strong light.

☆ Development
The developer is an alkaline solution. The photoresist in the exposed areas dissolves quickly in the alkaline solution at a certain temperature, while the photoresist in the unexposed areas (protected by the chromium plate) remains intact. This creates the desired pattern. After further acid etching, the pattern forms the CD pattern texture, resembling the grooves of a CD disc, resulting in the final CD product.